Plasma Sources Science and Technology · 2006 · 55 citations · 32 references
Natural SciencesMaterials SciencePhysicsPlasma PhysicsSpectroscopyTransport PhenomenaAtomic IonizationCharged Particle TransportIonization ProcessesPlasma DiagnosticsPlasma TransportAmbipolar DiffusionIon DiffusionIon TransportIonizationLangmuir ProbesMagnetron SputteringOptical AbsorptionSputtering
This paper deals with the diagnostics of a high power pulsed magnetron sputtering device (HPPMS). The HPPMS plasma was spatially and temporally characterized in the post-discharge using optical absorption spectroscopy and Langmuir probe time resolved measurements. A circular titanium target was used, the buffer gas was argon and the pressure was fixed at 4 Pa. The titanium densities (neutrals and ions) were measured by a pulsed resonant absorption spectroscopy technique. We found an ionization degree higher than 0.5. Comparison beetween the experimental results and a simple one-dimensional model of diffusion shows that in these conditions, the transport of neutral and ionized sputtered atoms is mainly controlled by diffusion (ambipolar diffusion for ions).
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Metal ion deposition from ionized mangetron sputtering discharge
S. M. Rossnagel, Jeffrey Hopwood · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1994 · 307 citations
Natural Sciences, Materials Engineering, Materials Science +17
Influence of high power densities on the composition of pulsed magnetron plasmas
Arutiun P. Ehiasarian, R. New, W.‐D. Münz et al. · Vacuum · 2002 · 302 citations