Ludovic de Poucques - Concepedia

Author

Ludovic de Poucques

Centre National de la Recherche Scientifique ORCID

Also Known As

De Poucques, L, De Poucques, Ludovic, L De Poucques, L de Poucques, L. De Poucques, L. de Poucques, Ludovic De Poucques, Ludovic de Poucques, Poucques, L. De, de Poucques, L.

Publications

886

Citations

H-Index

Concepts

All Affiliations

Centre National de la Recherche Scientifique Institut Jean Lamour Université de Lorraine Université Paris-Sud Laboratoire de Physique des Gaz et des Plasmas

About

Ludovic de Poucques is an author at Centre National de la Recherche Scientifique specializing in engineering, applied physics, and physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	17	24	597
2	Applied Physics	17	21	556
3	Natural Sciences	5	5	146
4	Biomolecular Engineering	1	1	13
5	Chemical Engineering	1	1	12

Ludovic de Poucques

Publications

799

Citations

H-Index

Page 1

	Year	Citations
Experimental study of a pre-ionized high power pulsed magnetron discharge Petr Vašina, Marcel Meško, Jean-Christophe Imbert, Plasma Sources Science and Technology Electrical EngineeringPlasma ElectronicsLow Current Pre-ionizationEngineeringPhysics	2007	61
Study of the transport of titanium neutrals and ions in the post-discharge of a high power pulsed magnetron sputtering device Ludovic de Poucques, Jean-Christophe Imbert, Caroline Boisse‐Laporte, Plasma Sources Science and Technology EngineeringGlow DischargeTitanium NeutralsOptical Absorption SpectroscopyIon Implantation	2006	54
Reduction of transient regime in fast preionized high-power pulsed-magnetron discharge Petr Vašina, Marcel Meško, M. Ganciu, Europhysics Letters (EPL) Electrical EngineeringPlasma ElectronicsEngineeringGlow DischargePulse Duration	2005	38
Ti–Ar scattering cross sections by direct comparison of Monte Carlo simulations and laser-induced fluorescence spectroscopy in magnetron discharges Daniel Lundin, Cătălin Vițelaru, Ludovic de Poucques, Journal of Physics D Applied Physics	2013	38
Time resolved metal line profile by near-ultraviolet tunable diode laser absorption spectroscopy Cătălin Vițelaru, Ludovic de Poucques, Tiberiu Minea, Journal of Applied Physics Transient GratingOptical MaterialsEngineeringAtomic Emission SpectroscopyLaser Applications	2011	36
The influence of CH4 addition on composition, structure and optical characteristics of SiCN thin films deposited in a CH4/N2/Ar/hexamethyldisilazane microwave plasma Simon Bulou, L. Le Brizoual, Patrice Miska, Thin Solid Films Materials ScienceOptical MaterialsEngineeringApplied PhysicsCh4 Addition	2011	36
Preionised pulsed magnetron discharges for ionised physical vapour deposition M. Ganciu, Stéphanos Konstantinidis, Y. Paint, Journal of Optoelectronics and Advanced Materials Pulsed Magnetron DischargesElectrical EngineeringEngineeringGlow DischargeApplied Physics	2005	29
Determination of titanium temperature and density in a magnetron vapor sputtering device assisted by two microwave coaxial excitation systems O. Leroy, Ludovic de Poucques, C. Boisse-Laporte, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Optical MaterialsEngineeringIon DensityVacuum DeviceIon Implantation	2004	26
Study of a fast high power pulsed magnetron discharge: role of plasma deconfinement on the charged particle transport Petr Vašina, Marcel Meško, Ludovic de Poucques, Plasma Sources Science and Technology Fast High PowerEngineeringMagnetron DischargeGlow DischargePlasma Science	2008	26
Space-resolved velocity and flux distributions of sputtered Ti atoms in a planar circular magnetron discharge Cătălin Vițelaru, Ludovic de Poucques, Tiberiu Minea, Plasma Sources Science and Technology	2011	25

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