42.2: World's Largest (15‐inch) XGA AMLCD Panel Using IGZO Oxide TFT

Je‐hun Lee, D. G. Kim, Dongju Yang, Kap‐Soo Yoon, Shi Yul Kim, Soon Kwon Lim, Sang Soo Kim, Kyoung‐Seok Son, Jang Yeon Kwon, S. M. Lee

SID Symposium Digest of Technical Papers · 2008 · 248 citations · 5 references

Concepts

Abstract

Abstract The world's largest (15‐inch) XGA active matrix liquid crystal display (AMLCD) panel made with IGZO TFTs (W/L=29.5/4 μm) was fabricated and evaluated with the field effective mobility of 4.2±0.4 cm 2 /V‐s, V th of −1.3±1.4V and sub‐threshold swing (SS) of 0.96±0.10 V/dec. for a manufacturing‐oriented process, the main factors affecting threshold voltage (V th ) of the IGZO thin film transistors (TFT) are investigated. On the glass surface, thicker regions of IGZO film have a negative threshold voltage shift. A dry etching process of molybdenum source and drain (S/D) causes negative shift of the average threshold voltage compared to wet etching in the bottom gate back channel etched TFTs. However, optimization of SiOx passivation and subsequent annealing shift average V th positively and reduce V th variation.

References

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