Publication | Closed Access
42.2: World's Largest (15‐inch) XGA AMLCD Panel Using IGZO Oxide TFT
246
Citations
5
References
2008
Year
Materials ScienceElectrical EngineeringEngineeringGlass SurfaceApplied PhysicsThreshold VoltageIgzo TftsSemiconductor Device FabricationThin Film Process TechnologyThin FilmsMicroelectronicsThin Film Processing
Abstract The world's largest (15‐inch) XGA active matrix liquid crystal display (AMLCD) panel made with IGZO TFTs (W/L=29.5/4 μm) was fabricated and evaluated with the field effective mobility of 4.2±0.4 cm 2 /V‐s, V th of −1.3±1.4V and sub‐threshold swing (SS) of 0.96±0.10 V/dec. for a manufacturing‐oriented process, the main factors affecting threshold voltage (V th ) of the IGZO thin film transistors (TFT) are investigated. On the glass surface, thicker regions of IGZO film have a negative threshold voltage shift. A dry etching process of molybdenum source and drain (S/D) causes negative shift of the average threshold voltage compared to wet etching in the bottom gate back channel etched TFTs. However, optimization of SiOx passivation and subsequent annealing shift average V th positively and reduce V th variation.
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