A physically based base pushout model for submicrometer BJTs in the presence of velocity overshoot

Abstract

By using a two-dimensional relaxation time approximation device simulator, base pushout phenomena for submicrometer bipolar junction transistors (BJTs) are analyzed. From the numerical analysis, it was clarified that, under the base pushout condition, the electron velocity exceeds the saturation velocity in most of the epi-collector region. Considering this velocity overshoot effect with two-dimensional carrier behavior, a base pushout model was developed. This model is applicable to the BJT equivalent circuit model. The model utility was verified for a 0.8 mu m emitter-width BIT, and excellent agreement with measured I-V characteristics was obtained over wide injection conditions. Scaling effects on the velocity overshoot are also calculated, based on the constant current scaling. It is shown that the base pushout is suppressed due to the increased velocity overshoot level as the device sizes are scaled down. >