Publication | Closed Access
A new methodology for the design centering of IC fabrication processes
55
Citations
16
References
1991
Year
EngineeringMultidisciplinary Design OptimizationIndustrial EngineeringElectronic Design AutomationProcess YieldSystem-level DesignComputer-aided DesignStructural OptimizationAdvanced DesignSocial SciencesComputational FabricationPhysical Design (Electronics)Computer-aided EngineeringPractical MethodologyYield OptimizationNew MethodologyElectronic PackagingIc Fabrication LinesTechnology Co-optimization3D Ic ArchitectureFabrication TechniqueDesignComputer EngineeringManufacturing SystemsIndustrial DesignMicrofabricationDesign CenteringIc Fabrication Processes
The authors describe a practical methodology that can be applied to optimize the process yield of IC fabrication lines. The yield maximization problem is first reformulated into a deterministic design centering problem. Macromodeling and problem decomposition are then applied to solve the design centering problem efficiently. The effectiveness of this methodology is illustrate through a simulation example involving a CMOS process adopted from an industrial line.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">></ETX>
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