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SiGe technology: application to wireless digital communications

17

Citations

7

References

2002

Year

Abstract

Heterojunction bipolar technology using SiGe epitaxial base grown by ultra high vacuum/chemical vapor deposition (UHV/CVD) offers very high performance and very low cost for the production of wireless communication high frequency ICs. This paper reports on the status of SiGe HBT development and compares it with existing Si and GaAs technologies.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">&gt;</ETX>

References

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