Electrical characteristics and short-channel effect of c-axis aligned crystal indium gallium zinc oxide transistor with short channel length

Yoshiyuki Kobayashi, Shinpei Matsuda, Daisuke Matsubayashi, Hideomi Suzawa, Masayuki Sakakura, Kazuya Hanaoka, Yutaka Okazaki, T. Yamamoto, Suguru Hondo, Takashi Hamada,

Japanese Journal of Applied Physics · 2014 · 38 citations · 31 references

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Abstract

A channel length of a c -axis aligned crystal indium gallium zinc oxide (CAAC-IGZO) transistor having low off-state current at a yA/µm level was decreased to 100 nm, and the electrical characteristics and short-channel effect of the CAAC-IGZO transistor were researched. As a result, we found that, in the CAAC-IGZO transistor with L = 100 nm, even with a gate insulator film having an equivalent oxide thickness (EOT) = 11 nm, an extremely small off-state current of 380 yA/µm at 85 °C is maintained, in addition channel length dependence of the electrical characteristics is hardly seen. Favorable values of characteristics of the CAAC-IGZO transistor can be obtained, such as subthreshold slope (SS) = 77 mV/dec, drain induced barrier lowering (DIBL) = 73 mV/V, threshold voltage ( V th ) = 0.65 V, and on-state current ( I on ) = 65 µA/µm. These results suggest the possibility that the CAAC-IGZO transistor can be applied to an LSI in a deep submicron region.

References

31