Japanese Journal of Applied Physics · 2014 · 38 citations · 31 references
SemiconductorsElectrical CharacteristicsElectrical EngineeringElectronic DevicesEngineeringSemiconductor TechnologyOxide ElectronicsElectronic EngineeringApplied PhysicsShort Channel LengthCaac-igzo TransistorGallium OxideIntegrated CircuitsShort-channel EffectMicroelectronicsGate Insulator FilmSemiconductor DeviceChannel Length
A channel length of a c -axis aligned crystal indium gallium zinc oxide (CAAC-IGZO) transistor having low off-state current at a yA/µm level was decreased to 100 nm, and the electrical characteristics and short-channel effect of the CAAC-IGZO transistor were researched. As a result, we found that, in the CAAC-IGZO transistor with L = 100 nm, even with a gate insulator film having an equivalent oxide thickness (EOT) = 11 nm, an extremely small off-state current of 380 yA/µm at 85 °C is maintained, in addition channel length dependence of the electrical characteristics is hardly seen. Favorable values of characteristics of the CAAC-IGZO transistor can be obtained, such as subthreshold slope (SS) = 77 mV/dec, drain induced barrier lowering (DIBL) = 73 mV/V, threshold voltage ( V th ) = 0.65 V, and on-state current ( I on ) = 65 µA/µm. These results suggest the possibility that the CAAC-IGZO transistor can be applied to an LSI in a deep submicron region.
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