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A study of high-speed normally off and normally on Al<sub>0.5</sub>Ga<sub>0.5</sub>As heterojunction gate GaAs FET's (HJFET)
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Citations
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References
1978
Year
Semiconductor TechnologyGate StructureElectrical EngineeringEngineeringHigh-speed ElectronicsElectronic EngineeringApplied PhysicsGaas FetN-type 10Power SemiconductorsMicroelectronicsSemiconductor Device
The dc, small-signal microwave, and large-signal switching performance of normally off and normally on Al <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.5</inf> Ga <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.5</inf> As gate heterojunction GaAs field-effect transistors (HJFET) with submicrometer gate lengths are reported. The structure of both types of devices comprises an n-type 10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">17</sup> -cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">-3</sup> Sn-doped active layer on a Cr-doped GaAs substrate, a p-type 10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">18</sup> -cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">-3</sup> Ge-doped Al <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.5</inf> Ga <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.5</inf> As gate layer and a p <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">+</sup> -type 5 × 10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">18</sup> -cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">-3</sup> Ge-doped GaAs "contact and cap" layer on the top of the gate. The gate structure is obtained by selectively etching the p <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">+</sup> -type GaAs and Al <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.5</inf> Ga <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.5</inf> As. Undercutting of the Al <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.5</inf> Ga <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.5</inf> As layer results in submicrometer gate lengths, and the resulting p <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">+</sup> -GaAs overhang is used to self-align the source and the drain with respect to the gate. Normally off GaAs FET's with 0.5- to 0.7-µm long heterojunction gates exhibit maximum available power gains (MAG) of about 9 dB at 2 GHz. Large-signal pulse measurements indicate an intrinsic propagation delay of 40 ps with an arbitrarily chosen 100-Ω drain load resistance in a 50-Ω microstrip circuit. Normally on FET's with submicrometer gate lengths (∼0.6 µm) having a total gate periphery of 300 µm and a corresponding dc transconductance of 20-30 mmhos exhibit a MAG of 9.5 dB at 8 GHz. The internal propagation delay time measured under the same conditions as above is about 20 ps.
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