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An n-channel BICFET in the GaAs/AlGaAs material system
12
Citations
8
References
1989
Year
SemiconductorsSemiconductor TechnologyElectrical EngineeringWide-bandgap SemiconductorEngineeringElectronic MaterialsNanoelectronicsHeterojunction FetApplied PhysicsQuantum MaterialsN-channel BicfetCharge SheetMolecular Beam EpitaxyMicroelectronicsSemiconductor Device
An n-channel BICFET (bipolar inversion channel FET) and an HFET (heterojunction FET) have been fabricated for the first time by MBE (molecular-beam epitaxy) growth with the charge sheet located on the wide-bandgap side of the heterointerface. This implementation is most desirable because of the potential for low resistance, high gain, and a temperature-stable structure. The HFET associated with the BICFET has a positive threshold, indicating that no channel exists in the equilibrium state.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">></ETX>
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