Spectral interferometry of semiconductor nanostructures

Abstract

Fourier transform spectral interferometry is applied to measure both amplitude and phase of the electric field in different types of semiconductor nanostructures, thus determining the real and imaginary parts of the dielectric function. The importance of measuring the phase is shown and discussed in three studies. First, the phase measurement is used to access directly the refractive index across excitonic resonances in bulk GaAs and AlGaAs-GaAs quantum wells, with unprecedented resolution. Second, we measure the density dependence of the full dielectric function across a Fano resonance in bulk GaAs and show that this allows us to obtain some information on the collisional broadening of the usually hidden linewidth of the coupled exciton/continuum. Third, the phase is studied in a complex heterostructure, a semiconductor microcavity. We investigate and discuss the effect of the cavity detuning and of the excitation density.