IEEE Transactions on Electron Devices · 1975 · 36 citations · 1 references
Natural SciencesMaterials SciencePhotonicsSurface ScienceThin FilmsOptical Thin FilmsThin Film LithographyThin Film Optical PropertiesThin-film PatterningContrast Transfer FunctionLinewidth BroadeningLinewidth NarrowingOptical LithographyPhotoresist Sacrificial LayersPhotoresistsReflectanceThickness-dependent Optical Properties
Photoresist thickness nonuniformities in the vicinity of profile steps on substrate surfaces lead to linewidth variations of AZ 1350 photoresist geometries. The effect increases with increasing reflectivity of the substrate, decreasing photoresist layer thickness, and decreasing contrast transfer of the exposure system. It is shown that the photoresist linewidth is maximum when the resist thickness is a multiple of half the exposure wavelength in the resist.
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