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Electrical properties of anodic and pyrolytic dielectrics on gallium arsenide
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1977
Year
DielectricsEngineeringElectrical PropertiesSemiconductorsFerroelectric ApplicationMaterials ScienceElectrical EngineeringOxide ElectronicsGallium OxideSemiconductor MaterialTemporary TrappingPyroelectricityElectrical PropertyDeposited Sixoynz FilmsElectronic MaterialsApplied PhysicsThin FilmsOhmic InsulatorElectrical Insulation
Capacitance–voltage and current–voltage measurements have been used to characterize dielectrics grown by anodization and by pyrolytic deposition on bulk n-type gallium arsenide. The anodic oxide is an ohmic insulator with a resistivity ≳1016 ohm cm and a breakdown field of 3×106 V/cm. Pyrolytically deposited SixOyNz films exhibited resistivities of 1015 ohm cm and breakdown fields between 5×106 and 1×107 V/cm. C–V data for the anodic and pyrolytic dielectrics are very similar, implying in each case: a fixed charge of more than 1012 electrons/cm2 in the dielectric, temporary trapping and release of 2–3×1010 electrons/cm2 at the semiconductor–dielectric interface for each volt of applied bias, and a U-shaped density of surface states in the upper half gap with a minimum value of 2–4×1012 cm−2 eV−1.