Chemical Vapor Deposition · 2013 · 11 citations · 9 references
Natural SciencesMaterials EngineeringMaterials SciencePolymer ChemistryPolymer EngineeringPolymer MaterialsPolymer SurfacesPolymer Thin FilmsPolymerization ChemistryPolymerization KineticsPolymerization ProcessesPolymerization Temperature EffectsRadiation-induced PolymerizationSilicon
The potential of hexyl acrylate as an initiator in photo‐initiated (pi) CVD is explored by demonstrating its auto‐polymerization under ultraviolet (UV) radiation of wavelength 254 nm. Deposition of poly(hexyl acrylate) films on silicon substrates proceeds at high rates, approaching 1.7 µm min −1 , at a stage temperature of 12.1°C, and the process is observed to be adsorption controlled.
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