Novel mononuclear zirconium and hafnium alkoxides; improved precursors for the MOCVD of ZrO2 and HfO2

Abstract

The novel complexes [Zr(OBut)2(OCMe2CH2OMe)2] (1) and [Hf(OBut)2(OCMe2CH2OMe)2] (2) are mononuclear and volatile, and are highly promising precursors for the deposition of zirconium dioxide and hafnium dioxide thin films by metalorganic chemical vapour deposition (MOCVD).