Hywel O. Davies - Concepedia

Author

Hywel O. Davies

University of Liverpool ORCID

Also Known As

Davies, H.O., Davies, Hywel O., H. O. Davies, H.O Davies, H.O. Davies, Hywel Davies, Hywel O Davies, Hywel O. Davies

122

Publications

1.4K

Citations

H-Index

Concepts

All Affiliations

University of Liverpool University College London Imperial College London Loughborough University

About

Hywel O. Davies is an author at University of Liverpool specializing in engineering, materials science, and chemistry.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	22	36	1.1K
2	Applied Physics	7	7	233
3	Natural Sciences	5	5	107
4	Biochemistry	2	2	46
5	Biomolecular Engineering	2	2	53

Hywel O. Davies

Publications

1.3K

Citations

H-Index

Page 1

	Year	Citations
Novel Mononuclear Alkoxide Precursors for the MOCVD of ZrO2 and HfO2 Thin Films Paul A. Williams, John L. Roberts, Anthony C. Jones, Chemical Vapor Deposition Materials ScienceHfo2 FilmsApplied ChemistryEngineeringOxide Electronics	2002	95
Nickel oxide sol–gel films from nickel diacetate for electrochromic applications J.L Garcia-Miquel, Qi Zhang, Stephanie Allen, Thin Solid Films Materials ScienceEngineeringElectrode-electrolyte InterfaceNickel DiacetateSol-gel Synthesis	2003	93
Aerosol Assisted Chemical Vapor Deposition of In<sub>2</sub>O<sub>3</sub> Films from Me<sub>3</sub>In and Donor Functionalized Alcohols S. Basharat, Claire J. Carmalt, Sarah A. Barnett, Inorganic Chemistry	2007	64
Crystal Structure of Bi(OCMe2CH2OMe)3 and Its Use in the MOCVD of Bi2O3 Paul A. Williams, A.C. Jones, Michael J. Crosbie, Chemical Vapor Deposition Materials ScienceInorganic ChemistryBismuth OxideCrystal StructureEngineering	2001	63
Ce(IV) Complexes with Donor-Functionalized Alkoxide Ligands: Improved Precursors for Chemical Vapor Deposition of CeO<sub>2</sub> Helen C. Aspinall, John Bacsa, Anthony C. Jones, Inorganic Chemistry Materials ScienceInorganic ChemistryInorganic CompoundVolatile Precursor CompoundsEngineering	2011	51
MOCVD of Strontium Tantalate Thin Films Using Novel Bimetallic Alkoxide Precursors Michael J. Crosbie, P.J. Wright, Hywel O. Davies, Chemical Vapor Deposition Materials ScienceLead-free PerovskitesEngineeringPerovskite Solar CellOxide Electronics	1999	48
Atomic layer deposition of ZrO2 thin films using a new alkoxide precursor Raija Matero, Mikko Ritala, Markku Leskelä, Journal of Non-Crystalline Solids Materials ScienceEngineeringOxide ElectronicsSurface ScienceApplied Physics	2002	48
Novel mononuclear zirconium and hafnium alkoxides; improved precursors for the MOCVD of ZrO2 and HfO2 Paul A. Williams, John L. Roberts, Anthony C. Jones, Journal of Materials Chemistry EngineeringZirconium DioxideChemistryChemical DepositionInorganic Material	2001	47
Effect of deposition temperature on the properties of CeO2 films grown by atomic layer deposition P King, M. Werner, Paul R. Chalker, Thin Solid Films Materials ScienceEngineeringCeo2 FilmsSurface ScienceApplied Physics	2011	38
Syntheses, X-ray structures and CVD studies of diorganoalkoxogallanes S. Basharat, Claire J. Carmalt, Robert G. Palgrave, Journal of Organometallic Chemistry X-ray CrystallographyCvd StudiesNatural SciencesMolecular Biology	2008	37

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