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Performance limiting surface defects in SiC epitaxial p-n junction diodes
220
Citations
20
References
1999
Year
Materials EngineeringElectrical EngineeringEngineeringSurface DefectsPower DeviceNanoelectronicsApplied PhysicsPower Semiconductor DeviceReverse LeakageSemiconductor Device FabricationPower ElectronicsMicroelectronicsBreakdown Voltage MappingSemiconductor Device
Effects of surface defects on performance of kV-class 4H- and 6H-SiC epitaxial p-n junction diodes were investigated. The perimeter recombination and generation, instead of the bulk process, are responsible for forward recombination current and reverse leakage current of the diodes, respectively. Mapping studies of surface morphological defects have revealed that triangular-shaped defects severely degrade high-blocking capability of the diodes whereas shallow round pits and scratch give no direct impact. Device-killing defects in SiC epilayers are discussed based on breakdown voltage mapping. Effective minority carrier lifetimes are mainly limited not by bulk recombination but by perimeter recombination.
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