Non‐Reflecting Silicon and Polymer Surfaces by Plasma Etching and Replication

Abstract

Maskless plasma etching forms nanospikes on a silicon wafer. The inverse of the nanospike pattern is replicated into a poly(dimethylsiloxane) (PDMS) film by casting. The PDMS functions as a stamp for replicating the original pattern into polymeric substrates. All nanospike-structured surfaces suppress light reflection and can be made self-cleaning.