2005 · 22 citations · 54 references
EngineeringDigital DesignElectrical EngineeringAnalog ElectronicsMicroelectronicsSemiconductor DevicesAnalog Integrated CircuitsCmos Circuit DesignDigital Integrated CircuitsIntegrated Circuit DesignMetal-oxide-semiconductor Field-effect TransistorsVoltage ScalingAnalog Circuit DesignCmos Analog Circuit DesignCmos ScalingDigital ControlGate LeakageGate Oxide LeakageLow-voltage Cmos DesignOxide Thin-film Transistors
CMOS evolution introduces several problems in analog design. Gate-leakage mismatch exceeds conventional matching tolerances requiring active cancellation techniques or alternative architectures. One strategy to deal with the use of lower supply voltages is to operate critical parts at higher supply voltages, by exploiting combinations of thin- and thick-oxide transistors. Alternatively, low voltage circuit techniques are successfully developed. In order to benefit from nanometer scale CMOS technology, more functionality is shifted to the digital domain, including parts of the RF circuits. At the same time, analog control for digital and digital control for analog emerges to deal with current and upcoming imperfections.
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FinFET-a self-aligned double-gate MOSFET scalable to 20 nm
Chenming Hu, Jeffrey Bokor, Tsu‐Jae King et al. · IEEE Transactions on Electron Devices · 2000 · 1.6K citations
Engineering, Electrical Engineering, Electronic Materials +13
R. Ho, Mark Horowitz · Proceedings of the IEEE · 2001 · 1.4K citations