Highly Conducting and Transparent SnO₂ Thin Films Prepared by RF Magnetron Sputtering on Low-Temperature Substrates

Abstract

Highly conducting and transparent thin films of undoped tin oxide (SnO 2 ) are prepared on unheated substrates (≦90°C) by rf magnetron sputtering under an applied external dc magnetic field. The lowest resistivity obtained is 1.9×10 -3 Ωcm. The SnO 2 films with a sheet resistance below 200 Ω/ s q and an average visible transmittance (between 400 and 700 nm) above 85%, and below 300 Ω/ s q above 80% (including organic film substrate) can be obtained for the films deposited on glass substrates and organic film substrates, respectively.