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Measurement of the effect of self-heating in strained-silicon MOSFETs
150
Citations
10
References
2002
Year
Electrical EngineeringEngineeringChannel TemperatureBias Temperature InstabilityApplied PhysicsStrained-silicon MosfetsPulse TechniqueThermodynamicsSilicon On InsulatorMicroelectronicsThermal EngineeringSemiconductor Device
The self-heating of strained-silicon MOSFETs is demonstrated experimentally. Output characteristics measured by a pulse technique, in which self-heating is absent, show as much as 15% greater drain current (for 15% Ge content) than the corresponding static measurements. Comparison of the current measured this way with the static measurements allows an estimate of the channel temperature during the static operation. The temperature rise is compared to a simple estimate of the thermal resistance of the FET.
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