Publication | Closed Access
A new approach to convex corner compensation for anisotropic etching of (100) Si in KOH
62
Citations
3
References
1996
Year
EngineeringMicrofabricationApplied PhysicsNew ApproachSemiconductor Device FabricationCorner CompensationSilicon On InsulatorMicroelectronicsPlasma EtchingAnisotropic Etching
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