Publication | Closed Access
Structural instability of 4H–SiC polytype induced by <i>n</i>-type doping
132
Citations
8
References
2002
Year
Materials EngineeringSemiconductorsMaterials ScienceSemiconductor TechnologyEngineeringDislocation InteractionCrystalline DefectsTransmission Electron MicroscopyShockley Partial DislocationsApplied PhysicsCondensed Matter PhysicsSilicon CarbideSemiconductor MaterialDefect FormationStructural InstabilityCarbide
Spontaneous formation of stacking faults in heavily nitrogen-doped 4H-polytype silicon carbide crystals have been observed by transmission electron microscopy (TEM). Faults were present in as-grown boules and additional faults were generated by annealing in argon at 1150 °C. All faults had identical structure consisting of six layers stacked in a cubic sequence as determined by high-resolution TEM, and were interpreted as a result of two Shockley partial dislocations gliding on two neighboring basal planes of SiC. It is argued that the energy of faulted 4H silicon carbide is lower than the energy of perfect heavily doped (n&gt;1×1019 cm−3) crystal at typical processing temperatures, thus providing a driving force for transformation.
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