FT IR spectroscopy of nitric acid oxidation of silicon with hafnium oxide very thin layer - Concepedia

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FT IR spectroscopy of nitric acid oxidation of silicon with hafnium oxide very thin layer

22

Citations

19

References

2014

Year

Martin Kopáni, Milan Mikula, Emil Pinčík, H. Kobayashi, Masatoshi Takahashi

Applied Surface Science

Oxidation ResistanceNatural SciencesSpectroscopySilicon On InsulatorApplied PhysicsInfrared SpectroscopyInfrared SensorNear-infrared SpectroscopyChemistryNitric Acid OxidationFt Ir SpectroscopyThin Layer

References

	Year	Citations

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