Publication | Open Access
1.24 μ m InGaAs/GaAs quantum dot laser grown by metalorganic chemical vapor deposition using tertiarybutylarsine
56
Citations
21
References
2004
Year
EngineeringLaser ApplicationsLaser MaterialOptoelectronic DevicesSemiconductor NanostructuresSemiconductorsSemiconductor LasersQuantum DotsMolecular Beam EpitaxyPulsed Laser DepositionCompound SemiconductorMaterials SciencePhotonicsPhotoluminescenceCrystalline DefectsOptoelectronic MaterialsGaas-based Laser DiodesArsenic HydrideGaas MatrixApplied PhysicsOptoelectronics
Metalorganic chemical vapor deposition of GaAs-based laser diodes, using self-organized InGaAs quantum dots (QDs), emitting at >1.24 μm is demonstrated. The environment-friendly alternative precursor tertiarybutylarsine is used as a substitute for arsenic hydride. The active region contains ten closely stacked InGaAs QD layers embedded in a GaAs matrix. Lasing emission at such long wavelengths was achieved by overgrowing the In0.65Ga0.35As QDs with a thin In0.2Ga0.8As film. The application of an in situ annealing step leading to the evaporation of plastically relaxed defect clusters is shown to be decisive for the laser performance. A transparency current density of 7.2 A/cm2 per QD layer and an internal quantum efficiency of 75% were achieved at room temperature.
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