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The investigation on strain relaxation and double peaks in photoluminescence of InGaN/GaN MQW layers
12
Citations
13
References
2009
Year
Wide-bandgap SemiconductorEngineeringEmission PeaksLtpl IntensityOptical PropertiesNanoelectronicsIngan/gan Mqw LayersLess Strain RelaxationMaterials SciencePhotoluminescencePhysicsNanotechnologyAluminum Gallium NitrideCategoryiii-v SemiconductorStrain RelaxationApplied PhysicsDouble PeaksGan Power DeviceOptoelectronics
Two emission peaks were observed in the low temperature photoluminescence (LTPL) spectra of an InGaN/GaN multiple quantum well (MQW) structure before and after nanopillar fabrication. After nanopillar fabrication it is found that among the two peaks the longer wavelength peak exhibits a clear blue shift and has a much stronger enhancement in LTPL intensity than the shorter one. Combined with x-ray diffraction and spatially resolved cathodoluminescence analyses, the difference induced by nanopillar fabrication is ascribed to different strain relaxation states in the lower and upper quantum well layers. It is found that the lower QW layers of the as-grown MQW which causes the longer wavelength PL peak are more strained, while the upper ones are almost fully strain-relaxed. Therefore, the nanopillar fabrication induces much less strain relaxation in the upper part of the MQW than in the lower one.
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