Publication | Closed Access
Enhancement in Thermal Oxidation of Silicon by Ozone
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1989
Year
Advanced Oxidation ProcessEngineeringOxidation ResistanceThermal OxidationIntegrated CircuitsChemistrySilicon On InsulatorIntegrated Circuit DevicesInterconnect (Integrated Circuits)Chemical EngineeringAdditional ImpuritiesAdvanced Packaging (Semiconductors)NanoelectronicsElectronic PackagingMaterials ScienceElectrical EngineeringSemiconductor Device FabricationOzoneMicroelectronicsSilicon DebuggingMicrofabricationSurface ScienceApplied Physics
It is demonstrated, that the thermal oxidation of silicon, which is one of the important processing steps in the fabrication of integrated circuit devices, can be enhanced without introducing additional impurities.