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A Level Set Approach to a Unified Model for Etching, Deposition, and Lithography II: Three-Dimensional Simulations
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1995
Year
Geometric ModelingEngineeringBeam LithographyMicrofabricationNatural SciencesFabrication TechniqueApplied PhysicsNumerical SimulationLithography IiComputer-aided DesignLevel Set ApproachUnified ModelComputational MechanicsMicroelectronicsPlasma Etching3D PrintingNanolithography MethodMultiscale Modeling
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