Ultra-shallow junction formation by spike annealing in a lamp-based or hot-walled rapid thermal annealing system: effect of ramp-up rate - Concepedia

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Ultra-shallow junction formation by spike annealing in a lamp-based or hot-walled rapid thermal annealing system: effect of ramp-up rate

20

Citations

5

References

1998

Year

Aditya Agarwal, A. T. Fiory, Hans‐Joachim L. Gossmann, Conor Rafferty, Peter Frisella

Materials Science in Semiconductor Processing

Materials EngineeringElectrical EngineeringEngineeringSpike AnnealingNanoelectronicsRamp-up RateApplied PhysicsUltra-shallow Junction FormationSemiconductor Device FabricationMicroelectronicsOptoelectronics

References

	Year	Citations

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