A Cat-CVD Si3N4 film study and its application to the ULSI process - Concepedia

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A Cat-CVD Si3N4 film study and its application to the ULSI process

13

Citations

4

References

2001

Year

Y. Uchiyama, Atsushi Masuda, Hideki Matsumura

Thin Solid Films

Materials ScienceMaterials EngineeringElectrical EngineeringEngineeringSurface ScienceApplied PhysicsUlsi ProcessSemiconductor Device FabricationVacuum DeviceSilicon On InsulatorMicroelectronicsChemical Vapor DepositionThin Film Processing

References

	Year	Citations

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