A Cat-CVD Si3N4 film study and its application to the ULSI process

Formation of Silicon-Based Thin Films Prepared by Catalytic Chemical Vapor Deposition (Cat-CVD) Method

Hideki Matsumura · Japanese Journal of Applied Physics · 1998 · 230 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17

Amorphous silicon produced by a new thermal chemical vapor deposition method using intermediate species SiF2

Hideki Matsumura, Hiroyuki Tachibana · Applied Physics Letters · 1985 · 134 citations

Natural Sciences, Materials Engineering, Materials Science +17

Silicon nitride produced by catalytic chemical vapor deposition method

Hideki Matsumura · Journal of Applied Physics · 1989 · 84 citations

Engineering, Materials Engineering, Materials Science +17

Improved Properties of Silicon Nitride Films Prepared by the Catalytic Chemical Vapor Deposition Method

Shinya Okada Shinya Okada, Hideki Matsumura · Japanese Journal of Applied Physics · 1997 · 48 citations

Engineering, Materials Engineering, Materials Science +16