Properties of large-area nanomagnet arrays with 100 nm period made by interferometric lithography

Abstract

A method is presented for the fabrication of large-area arrays of magnetic particles with 100 nm period, using achromatic interferometric lithography combined with etching, electrodeposition, or an evaporation and liftoff processes. These “nanomagnet” arrays have applications in patterned magnetic media, in magnetic memories, and for studies of particle interactions.