Publication | Open Access
Predictive model for scanned probe oxidation kinetics
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Citations
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References
2000
Year
Predictive ModelChemical EngineeringElectrical EngineeringEngineeringOxidation ResistancePulse DurationScanning Probe MicroscopyApplied PhysicsMicroanalysisImplicit AssumptionsAnalytical ChemistryChemistryInstrumentationMicroelectronicsChemical KineticsElectrochemistryOxide Growth Rate
Previous descriptions of scanned probe oxidation kinetics involved implicit assumptions that one-dimensional, steady-state models apply for arbitrary values of applied voltage and pulse duration. These assumptions have led to inconsistent interpretations regarding the fundamental processes that contribute to control of oxide growth rate. We propose a model that includes a temporal crossover of the system from transient to steady-state growth and a spatial crossover from predominantly vertical to coupled lateral growth. The model provides an excellent fit of available experimental data.
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