IEEE Transactions on Electron Devices · 1989 · 33 citations · 19 references
EngineeringComputer EngineeringElectrical EngineeringMicroelectronicsSemiconductor DevicesVlsi DesignApplication-specific Integrated CircuitsCmos Circuit DesignComplementary Metal-oxide-semiconductor TechnologyIntegrated Circuit DesignIntegrated Circuit DevicesIntegrated Circuit FabricationCmos Fabrication ProcessesCmos Logic CircuitsCmos Logic DesignHeterojunction Bipolar TransistorsHeterojunction DevicesHeterostructure Field-effect TransistorsHeterostructure TransistorsSwitching Behavior
The development of heterojunction integrated injection logic (HI/sup 2/L) since 1982 is described. The baseline process that uses AlGaAs/GaAs emitter-down HBTs (heterojunction bipolar transistors) as the switching element is presented. Two sets of design rules, one using a 7.0- mu m collector and 8.0- mu m metal pitch and another using a 5.0- mu m collector and 5.0- mu m metal pitch, have been developed for the pilot line circuit fabrication. Typical propagation delays obtained for a fan-out=4 HI/sup 2/L gate using the 7.0- and 5.0- mu m collector processes are 250 and 150 ps, respectively, at a power dissipation of 5 mW per gate. LSI and VLSI circuits as complex as 4 K-gate arrays and 32-bit MIPS microprocessors have been fabricated successfully using the HI/sup 2/L technology.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">></ETX>
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A.Y. Cho, John R. Arthur · Progress in Solid State Chemistry · 1975 · 1.2K citations
Metalorganic Chemical Vapor Deposition of III-V Semiconductors
Russell D. Dupuis · Science · 1984 · 316 citations
GaAs MESFET logic with 4-GHz clock rate
R.L. Van Tuyl, C.A. Liechti, R.E. Lee et al. · IEEE Journal of Solid-State Circuits · 1977 · 152 citations
Engineering, Computer Engineering, Electrical Engineering +17