Conduction and Valence Band Positions of Ta<sub>2</sub>O<sub>5</sub>, TaON, and Ta<sub>3</sub>N<sub>5</sub> by UPS and Electrochemical Methods

Wang‐Jae Chun, Akio Ishikawa, H. Fujisawa, Tsuyoshi Takata, Junko N. Kondo, Maki Kawai, Yasumichi Matsumoto, Kazunari Domen

The Journal of Physical Chemistry B · 2003 · 1K citations · 17 references

Concepts

Abstract

The conduction and valence band edges for electronic band gaps and Fermi levels are determined for Ta 2 O 5, TaON, and Ta 3 N 5 by ultraviolet photoelectron spectroscopy (UPS) and electrochemical analyses. Reasonable agreement between the results of the two methods is obtained at the pH at which the ζ potentials of the particles are zero. The tops of the valence bands are found to be shifted to higher potential energies on the order Ta 2 O 5 < TaON < Ta 3 N 5, whereas the bottoms of the conduction bands are very similar in the range −0.3 to −0.5 V (vs NHE at pH = 0). From the results, it is concluded that TaON and Ta 3 N 5 are promixing catalysts for the reduction and oxidation of water using visible light in the ranges λ < 520 nm and λ < 600 nm, respectively. It is also demonstrated that the proposed UPS technique is a reliable alternative to electrochemical analyses for determining the absolute band gap positions for materials in aqueous solutions that would otherwise be difficult to measure using electrochemical methods.

References

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