Nanoscale photolithography by means of surface plasmon interference

Abstract

We discuss a technique for obtaining surface plasmon interference patterns, which may find use in photolithography. To obtain the interference patterns we propose that a diffraction grating with a metal film coated onto the substrate should be used. The modeling results show that it is possible to produce a high-contrast interference pattern. The grating period can be several times that of the interference pattern produced. The electric field energy density in interference maxima is tens of times that of the incident wave.