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Effects of interfacial NH3/N2O-plasma treatment on the structural and electrical properties of ultra-thin HfO2 gate dielectrics on p-Si substrates

DOI

23

Citations

9

References

2005

Year

S. Maikap, Je‐Hun Lee, Rajat Mahapatra, Samik Pal, Y.S. No, Won Kook Choi, S. K. Ray, Doh-Y. Kim
Solid-State Electronics

References

YearCitations

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