Physics Research International · 2010 · 50 citations · 12 references
Natural SciencesElectrical EngineeringPhysicsPlasma PhysicsThin FilmsHigh-temperature PlasmasLow-temperature PlasmasPlasma DiagnosticsPlasma FundamentalsPlasma SourcesPlasma-surface InteractionsInductively Coupled Plasma AnalysisInductively Coupled Plasma SourcesInductively Coupled PlasmasNonthermal Plasma Sources
The principle of inductively coupled plasma (ICP) and perspective of ICP development are reviewed. Multispiral coil ICP (MSC-ICP), which has the advantages of low inductance, high efficiency, and excellent uniformity, is discussed in detail. Applications to thin film processing technologies and the future prospects of ICP are also described.
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