Publication | Closed Access
Ultra-shallow junction formation by excimer laser annealing and low energy (<1 keV) B implantation: A two-dimensional analysis
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Citations
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References
2002
Year
Advanced Laser ProcessingB ImplantationEngineeringPhysicsApplied PhysicsExcimer LaserLaser Processing TechnologyUltra-shallow Junction FormationSemiconductor Device FabricationMolecular Beam EpitaxyOptoelectronics
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