Structural aspects of tertiary amine adducts of alane and gallane

Completion and refinement of crystal structures with<i>SIR</i>92

Angela Altomare, G. Cascarano, Carmelo Giacovazzo et al. · Journal of Applied Crystallography · 1993 · 5.1K citations

Natural Sciences, Chemistry, Computational Chemistry +16

Trimethylamine complexes of alane as precursors for the low-pressure chemical vapor deposition of aluminum

Wayne L. Gladfelter, David C. Boyd, Klavs F. Jensen · Chemistry of Materials · 1989 · 139 citations

Natural Sciences, Chemistry, Materials Science +10

Organometallic precursors in the growth of epitaxial thin films of III-V semiconductors by metal-organic chemical vapor deposition (MOCVD)

P. Zanella, G. Rossetto, N. Brianese et al. · Chemistry of Materials · 1991 · 69 citations

Natural Sciences, Chemistry, Materials Science +17

Laser-induced chemical vapor deposition of aluminum

Thomas H. Baum, Carl E. Larson, Robert L. Jackson · Applied Physics Letters · 1989 · 68 citations

Natural Sciences, Chemistry, Materials Science +14

Dimethylethylamine alane and N-methylpyrrolidine alane. A convenient synthesis of alane, a useful selective reducing agent in organic synthesis

E. M. Marlett, Won Suh Park · The Journal of Organic Chemistry · 1990 · 55 citations

Natural Sciences, Chemistry, Medicinal Chemistry +6