Magnetotransport properties of Ge channels with extremely high compressive strain

Abstract

Ge channel structures with extremely high compressive strain up to 2.8% were fabricated and their magnetotransport properties were evaluated. It was found that at the same hole density the sample with the higher strain showed the lower hole effective mass and that the compressive strain effectively reduced the effective mass. The Dingle ratios obtained were very high (>5) for all samples, indicating that remote impurity scattering was a dominant scattering mechanism rather than high angle scatterings caused by degradation of the channel layers. This result strongly suggests that Ge channels with extremely high strain are very promising for high performance complementary-metal-oxide-semiconductor applications.