Atomic layer deposition of SiO2 from Tris(dimethylamino)silane and ozone by using temperature-controlled water vapor treatment - Concepedia

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Atomic layer deposition of SiO2 from Tris(dimethylamino)silane and ozone by using temperature-controlled water vapor treatment

41

Citations

14

References

2010

Year

Fumihiko Hirose, Yuta Kinoshita, Suguru Shibuya, Y. Narita, Yutaka Takahashi, Hironobu Miya, Kazuro Hirahara, Yoshinari Kimura, Michio Niwano

Thin Solid Films

Environmental ChemistryChemical EngineeringEngineeringAtmospheric PhotochemistryEnvironmental EngineeringSurface ScienceChemistryChemical DepositionSilicon On InsulatorChemical Vapor DepositionAtomic Layer Deposition

References

	Year	Citations

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