<title>Xenon liquid-jet laser plasma source for EUV lithography</title> - Concepedia

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<title>Xenon liquid-jet laser plasma source for EUV lithography</title>

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2000

Year

Bjoern A. M. Hansson, Magnus Berglund, O. Hemberg, Hans M. Hertz

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringXenon JetLaser Plasma PhysicsEuv LithographyApplied PhysicsInertial Confinement FusionProjection LithographyLaser Plasma PhysicPlasma PhotonicsTechnologyNozzle OrificeOptoelectronicsPlasma Application

Abstract

We describe a laser-plasma source based on a cryogenic xenon liquid-jet target suitable for extreme ultraviolet (EUV) projection lithography. Recent improvements in the stability of the xenon jet allows efficient laser-plasma operation several millimeters away from the nozzle orifice. We present the first preliminary laser-to-EUV conversion efficiencies, although under non-optimized conditions, for the source.