Publication | Closed Access
Schottky barrier heights of n-type and p-type Al/sub 0.48/In/sub 0.52/As
60
Citations
16
References
1991
Year
Materials ScienceWide-bandgap SemiconductorElectrical EngineeringAluminium NitrideEngineeringSurface ScienceApplied PhysicsCondensed Matter PhysicsQuantum MaterialsSchottky BarriersSemiconductor MaterialMetal ContactMolecular Beam EpitaxySchottky Barrier HeightsElectrical Property
The authors report electrical measurements on four different metal contacts which formed Schottky barriers to lightly doped complementary n- and p-type Al/sub 0.48/In/sub 0.52/As epitaxial material grown by molecular beam epitaxy on semi-insulating InP substrates. The Schottky contact metals studied were Au, Al, Pt, and tri-layer Ti/Pt/Au. The Schottky barrier heights varied from 0.560 eV for Al on n-type AlInAs to 0.905 eV for Al on p-type AlInAs, with intermediate values for the other metals studied. The sum of n- and p-type Schottky barrier heights for each metal contact ranged from 1.440 to 1.465 eV, in good agreement with the accepted Al/sub 0.48/In/sub 0.52/As bandgap value of 1.45 eV.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">></ETX>
| Year | Citations | |
|---|---|---|
Page 1
Page 1