Publication | Closed Access
Low-Dimensional Waveguide Grating Fabrication in GaN with Use of SiCl4/Cl2/Ar-Based Inductively Coupled Plasma Dry Etching
15
Citations
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References
2009
Year
Electrical EngineeringEngineeringApplied PhysicsAluminum Gallium NitrideGan Power DeviceCategoryiii-v SemiconductorPlasma EtchingOptoelectronicsPlanar Waveguide Sensor
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