Interference lithography by a soft x-ray laser beam: Nanopatterning on photoresists

Abstract

We have studied the feasibility of high-resolution laser interference lithography using a tabletop 46.9nm, 1.5ns Ar laser, combined with two different optical configurations based on a Lloyd’s mirror interferometer. Using one of these schemes we have encoded periodic grating structures with a half pitch of 42nm and a vertical modulation of 5nm on a commercial PMMA photoresist. Experiments performed with larger half-pitch structures and detailed theoretical calculations demonstrate the potentiality of producing periodic structures with a half-pitch resolution down to 20nm and a height of up to 60nm. The results can be of considerable interest for the development of a complete high-resolution lithographic process operating with the 47nm laser wavelength.