Applied Physics Letters · 1986 · 66 citations · 15 references
Natural SciencesMaterials SciencePhysicsCondensed Matter PhysicsSemiconductor MaterialsSurface ScienceEpitaxial GrowthSemiconductor Crystal GrowthSemiconductor InterfacesSemiconductor PhysicsSemiconductor SurfacesSurface CrystallographyAdsorption On SemiconductorsCrystal Surface SymmetryEpitaxial MaterialsMolecular Beam EpitaxyReflection High-energy Electron DiffractionSemiconductor CrystallographySurface GrowthSurface Symmetry
When CdTe is grown by molecular beam or organometallic vapor phase epitaxy on (100) GaAs, the layer can grow with either a (100) or (111) orientation. Reflection high-energy electron diffraction and Auger studies are presented here which show that adsorption of different submonolayer amounts of Te on a GaAs surface can change the surface symmetry and the resulting CdTe orientation. A precursor surface to (111) growth results from the formation of a relatively Te-poor Ga-As-Te surface phase. A relatively Te-rich structure yields a surface with (100) symmetry and lead to (100) growth.
15
Lattice match: An application to heteroepitaxy
A. Zur, T. C. McGill · Journal of Applied Physics · 1984 · 388 citations
Surface stoichiometry and structure of GaAs
John R. Arthur · Surface Science · 1974 · 330 citations
Natural Sciences, Materials Engineering, Materials Science +12