Publication | Closed Access
Influence of Ga-As-Te interfacial phases on the orientation of epitaxial CdTe on GaAs
66
Citations
15
References
1986
Year
Materials ScienceSemiconductorsElectrical EngineeringIi-vi SemiconductorEngineeringPhysicsSurface ScienceApplied PhysicsCondensed Matter PhysicsSemiconductor MaterialCdte OrientationGaas SurfaceMolecular Beam EpitaxyEpitaxial GrowthEpitaxial CdteSurface SymmetryCompound SemiconductorGa-as-te Interfacial Phases
When CdTe is grown by molecular beam or organometallic vapor phase epitaxy on (100) GaAs, the layer can grow with either a (100) or (111) orientation. Reflection high-energy electron diffraction and Auger studies are presented here which show that adsorption of different submonolayer amounts of Te on a GaAs surface can change the surface symmetry and the resulting CdTe orientation. A precursor surface to (111) growth results from the formation of a relatively Te-poor Ga-As-Te surface phase. A relatively Te-rich structure yields a surface with (100) symmetry and lead to (100) growth.
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