Full-field hard x-ray microscopy below 30 nm: a challenging nanofabrication achievement

Abstract

The fabrication of devices to focus hard x-rays is one of the most difficult-and important-challenges in nanotechnology. Here we show that Fresnel zone plates combining 30 nm external zones and a high aspect ratio finally bring hard x-ray microscopy beyond the 30 nm Rayleigh spatial resolution level and measurable spatial frequencies down to 20-23 nm feature size. After presenting the overall nanofabrication process and the characterization test results, we discuss the potential research impact of these resolution levels.