Journal of Applied Physics · 1999 · 94 citations · 36 references
EngineeringMaterials EngineeringMaterials ScienceElectronic MaterialsMaterials CharacterizationSemiconductor MaterialsEpitaxial GrowthIii-v SemiconductorsSemiconductor Crystal GrowthSemiconductor PhysicsWide Band Gap SemiconductorsWide-bandgap SemiconductorsElastic ConstantsEpitaxial Lateral OvergrowthFinite StrainGallium NitrideLattice ConstantsResidual StrainStiffnessStrain Effects
Structural and vibrational properties of device quality pure GaN substrate grown using a lateral epitaxial overgrowth (LEO) technique were studied using x-ray diffraction, Brillouin, Raman, and infrared spectroscopy. Lattice constants were found to be a=3.1896±0.0002 Å and c=5.1855±0.0002 Å. Comparing the results with those on GaN epilayer directly grown on sapphire substrate, it is shown that the GaN substrate is indeed of high quality, i.e., the lattice is relaxed. However the GaN substrate has a small enough but finite residual strain arising from the pileup of the lateral growth front on SiO2 masks in the course of LEO. It was also found that the elastic stiffness constants C13 and C44, are more sensitive to the residual strain than the optical phonon frequencies. The high frequency and static dielectric constants were found to be 5.14 and 9.04. The Born and Callen effective charges were found to be 2.56 and 0.50.
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