Massively parallel, large-area maskless lithography

Abstract

We have developed a high-throughput scanning maskless lithography technology for patterning high-resolution features on large-area substrates. This technology, which features a spatial light modulator array and a seamless-stitching scanning technique, was used to perform imaging exposures at micron-level resolution, patterning seamlessly over exposure areas significantly larger than the field size of the projection lens. This technology is attractive for a variety of applications that currently rely on mask-based lithographic processes.