Publication | Closed Access
A saddle field ion source of spherical configuration for etching and thinning applications
70
Citations
1
References
1974
Year
Materials ScienceEngineeringElectron-beam LithographyPhysicsMicrofabricationSurface ScienceApplied PhysicsSpherical ConfigurationIon BeamVacuum DeviceIon EmissionMicroelectronicsPlasma Etching
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