X and K band ESR study of the Pb Interface centres in thermally oxidized p-type (001)Si wafers at low temperatures and influence of medium-dose As+ ion implantation - Concepedia

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X and K band ESR study of the Pb Interface centres in thermally oxidized p-type (001)Si wafers at low temperatures and influence of medium-dose As+ ion implantation

35

Citations

16

References

1984

Year

A. Stesmans, Johan Braet, J. Witters, R. F. DeKeersmaecker

Surface Science

Materials ScienceIon ImplantationPb InterfaceLow TemperaturesSi WafersEngineeringApplied PhysicsSemiconductor MaterialElectronic PackagingSilicon On InsulatorMicroelectronics

References

	Year	Citations

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